Diffraction active Optical Element (DOE) is a burgeoning optical element that flourishes in recent years. DOE usually adopts micro-nano etching process to form two-dimensional distribution diffraction units. Each diffraction unit can have a specific morphology and refractive index, etc., to fine-regulate the laser wavefront phase distribution. After passing through each diffraction unit, the laser diffracts and interferes at a certain distance (usually infinity or the focal plane of the lens), resulting in a specific distribution of light intensity. In cooperation with many high-quality DOE suppliers abroad, ELITE can also customize DOE lenses according to customers' requirements and select high-quality DOE lenses. Has a bit of matrix, 3 lines, 5 lines, 7 lines, 11 lines, 81 lines and other 16 different pattern production
Featurs & Benefits
Specification
| Output Power (mW) | ≤200 mW |
| Spatial Mode | Multi Transverse Mode |
| Laser Drive Modes | CW, Analog Modulation, Digital Modulation, Computer Control |
| ESD Protection | Level 4 |
| Operating Temperature | -20℃ to 60℃ |
| Storage Temperature | -45℃ to 85℃ |
| MTBF | ＞10,000 hour |
Application
Car Scanning
3D Scanning
Machine Vision
Surface Defect Detection
Industrial Inspection
Structured Lighting
Customization
| Specification | Dot Matrix | Truly-Random Pattern | Pseudo Random Pattern | Square Grid 51x51 Lines |
 |  |  |  | |
| Optimum Wavelength Range | 560-720nm | 820-860nm | 810-850nm | 530-660nm |
| Design Wavelength | 660nm | 830nm | 830nm | 660nm |
| Output Power(mW) | <150mW | <200mW | <200mW | <150mW |
| Spatial Mode | Multi Transverse Mode | |||
Pattern Size @100mm Distance （@Design Wavelength） | a=38.0mm b=26.6mm c=1.7mm d=26.6mm | W:118.5mm H:86.9mm D:146.9mm | W:118.5mm H:86.5mm D:146.7mm | W:39mm H:39mm D:55mm Line Spacing:0.77mm |
Pattern Angles （@Design Wavelength） | α:21.5° β:15.2° γ:0.9° δ:15.2° | W:61.3° H:47.0° D:72.6° | W:61.3° H:46.8° D:72.5° | W:22° H:22° D:31° Angle betw. Lines：0.44° |
| Laser Drive Modes | CW, Analog Modulation, Digital Modulation, Computer Control | |||
| ESD Protection | Level 4 | |||
| Operating Temperature | -20℃ to 60℃ | |||
| Storage Temperature | -45℃ to 85℃ | |||
| 产品参数 | 多线 | 线式&点式 | 十字线式 | 十字线式&点式 |
 |  |  |  | |
| Optimum Wavelength Range | 530-670nm | 450-700nm | 580-660nm | 480-600nm |
| Design Wavelength | 635nm | 635nm | 650nm | 520nm |
| Output Power(mW) | <150mW | <150mW | <150mW | <60mW |
| Spatial Mode | Multi Transverse Mode | |||
Pattern Size @100mm Distance （@Design Wavelength） | a=76.70mm b=54.4mm c=5.4mm d=54.5mm | a=10.5mm b=2.6mm | a=153.5mm | a=81.9mm b=16.1mm |
Pattern Angles （@Design Wavelength） | α:40.2° β:30.4° γ:3.0° δ:30.4° | α:6° β:1.5° | α:75.0° | α:44.5° β:9.2° |
| Laser Drive Modes | CW, Analog Modulation, Digital Modulation, Computer Control | |||
| ESD Protection | Level 4 | |||
| Operating Temperature | -20℃ to 60℃ | |||
| Storage Temperature | -45℃ to 85℃ | |||
Solution
Laser illumination source is the most important element of an efficient 3D Machine Vision System. Scanning efficiency, resolution and accuracy of machine vision system is determined by Laser uniformity (distribution quality).
Client Application
Beijing City
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Suzhou City
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Product Related
ELITE's proprietary "Special Lens" uniform line laser is the best choice for machine vision, 3D scanning and measurement. Unique design and technology provide high uniform power and uniform linewidth.
Integrated high power uniform line laser serves as a precise laser scanning and measuring aid especially for Industrial solutions. Its specialties of high output power and superior line enable the high stability and high reliability in performance even in harsh environments.
